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Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use. Review: Lot's of valuable information but also lots of typo's - I believe this to be a very valuable book with lots of information, although it's probably rapidly becoming outdated. Then again information on photoresists is one of the most closely guarded industry secrets, so every little bit helps. It's more of an editor's collection of published papers, not a textbook per se. So it is highly valuable for engineers like myself here and now. Unfortunately there are lot's of typo's, sometimes obvious sometimes not, so you have to be careful with how you use it.
| Best Sellers Rank | #10,079,330 in Books ( See Top 100 in Books ) #216 in VLSI & ULSI Circuits #1,407 in Physical Chemistry #1,591 in Nanotechnology (Books) |
| Customer Reviews | 4.0 out of 5 stars 1 Review |
I**A
Lot's of valuable information but also lots of typo's
I believe this to be a very valuable book with lots of information, although it's probably rapidly becoming outdated. Then again information on photoresists is one of the most closely guarded industry secrets, so every little bit helps. It's more of an editor's collection of published papers, not a textbook per se. So it is highly valuable for engineers like myself here and now. Unfortunately there are lot's of typo's, sometimes obvious sometimes not, so you have to be careful with how you use it.
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